US Patent Issued to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on Aug. 12 for "Plasma source, and atomic clock employing plasma source" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,389,520, issued on Aug. 12, was assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan).

"Plasma source, and atomic clock employing plasma source" was invented by Yuuichi Kurashima (Tsukuba, Japan), Taisei Motomura (Tosu, Japan), Shinya Yanagimachi (Tsukuba, Japan), Hideki Takagi (Tsukuba, Japan), Eiji Higurashi (Tsukuba, Japan) and Takashi Matsumae (Tsukuba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A small plasma source that enables highly efficient discharge in an ultra-high vacuum state includes a first magnet, a second magnet arranged so that a second magnetic pole faces the first magnetic pole of the first m...