US Patent Issued to Nanyang Technological University on Nov. 4 for "Laser source and method for forming the same" (Singaporean Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,401, issued on Nov. 4, was assigned to Nanyang Technological University (Singapore).

"Laser source and method for forming the same" was invented by Yongquan Zeng (Singapore), Udvas Chattopadhyay (Singapore), Baile Zhang (Singapore), Yi Dong Chong (Singapore) and Qijie Wang (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to embodiments of the present invention, a laser source is provided. The laser source includes a photonic crystal structure including a first domain having a plurality of first holes defined therein, the first domain being associated with a first set of Chern numbers, and a second domain having a plurality of secon...