US Patent Issued to Nanyang Technological University on Dec. 16 for "Thin film, method of producing the thin film, and product comprising the thin film" (Singaporean Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,496,848, issued on Dec. 16, was assigned to Nanyang Technological University (Singapore).

"Thin film, method of producing the thin film, and product comprising the thin film" was invented by Hongwei Duan (Singapore) and Ling Bai (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "An aspect of the disclosure relates to a thin film including an amorphous array of particles including a top surface and a bottom surface opposing each other, the thin film exhibiting thin film interference and further coherent scattering from the amorphous array of particles, wherein the thin film may include first regions and second regions, wherein the thin film interf...