US Patent Issued to Nanyang Technological University on April 22 for "Surface conditioner for electroless deposition" (Singaporean Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,391, issued on April 22, was assigned to Nanyang Technological University (Singapore).

"Surface conditioner for electroless deposition" was invented by Jian Rong Chong (Singapore) and Hirotaka Sato (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition which conditions a surface for electroless deposition of a metal is disclosed. The composition comprises a polymer surfactant comprising repeating units of a monomer, wherein each of the repeating units comprises a functional group; a metal ion; and water, wherein the functional group in each of the repeating units forms a complex with the metal ion. In a preferred embodiment, the func...