US Patent Issued to NANYA TECHNOLOGY on Sept. 30 for "Conductive structure and capacitor structure and method for manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,425, issued on Sept. 30, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Conductive structure and capacitor structure and method for manufacturing the same" was invented by Pin-Jhu Li (New Taipei, Taiwan) and Shih-Fan Kuan (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A conductive structure and a capacitor structure and a method of manufacturing a conductive structure are provided. The conductive structure includes a first support layer, a second support layer, a first conductive via, a third support layer and a second conductive via. The second support layer is disposed over the first support layer. The first conduc...