US Patent Issued to NANYA TECHNOLOGY on Sept. 23 for "Deposition system for fabricating semiconductor device structure" (Taiwanese Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,595, issued on Sept. 23, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Deposition system for fabricating semiconductor device structure" was invented by Tzu-Ching Tsai (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides a deposition system. The deposition system includes a deposition module executing a first deposition recipe on a first wafer to turn a first wafer state of the first wafer to a second wafer state; a first measurement module collecting the second wafer state of the first wafer to generate a first set of data; and an artificial intelligence module coupled to the first measure...