ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,465, issued on Oct. 7, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Method of processing a substrate" was invented by Chih-Ying Tsai (New Taipei, Taiwan), Jui-Seng Wang (New Taipei, Taiwan) and Yi-Yi Chen (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides a method of processing a substrate. The method of processing the substrate includes steps of forming a photosensitive layer on the substrate; performing a first exposure process to expose the photosensitive layer to actinic radiation through a first mask; performing a first developing process to remove portions of the photosensitive laye...