US Patent Issued to NANYA TECHNOLOGY on Nov. 4 for "Semiconductor device including mark structure for measuring overlay error and method for manufacturing the same" (Taiwanese Inventor)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,145, issued on Nov. 4, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Semiconductor device including mark structure for measuring overlay error and method for manufacturing the same" was invented by Chih-Hsuan Yeh (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device and method for manufacturing the same are provided. The semiconductor device includes a substrate, a first pattern and a second pattern. The first pattern is disposed on the substrate. The first pattern includes a first segment and a second segment, each of which extends along a first direction. The second pattern is disposed on the first p...