ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,144, issued on Nov. 4, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Overlay metrology mark" was invented by Kai Zhang (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides an overlay metrology mark and a method of determining an overlay error during a semiconductor fabrication. The overlay metrology mark, for determining an overlay error between two successive layers of a substrate, includes a first axis, a second axis, a target feature, a first alignment feature, and a second alignment feature. The second axis crosses the first axis. The target feature is disposed at an intersection of the ...