ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,775, issued on Nov. 25, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Semiconductor structure" was invented by Sheng-Fu Huang (New Taipei, Taiwan) and Shing-Yih Shih (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a first chip and a second chip bonded to the first chip. The first chip includes a first semiconductor substrate, a first multi-level interconnect structure over the first semiconductor substrate, a first redistribution layer (RDL) over a conductive line of the first multi-level interconnect structure, a compact layer over the first RDL and the first multi-level intercon...