ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,224, issued on Nov. 25, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Method and system for overlay measurement" was invented by Chun-Yen Wei (Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses present disclosure provides a method for overlay measurement. The method includes forming a first target on a first layer; forming a second target on a second layer different from the first layer, wherein the first target and the second target are not overlapped to each other; positioning a lens including a grating configured thereon at a first location to completely overlap with the first target an...