US Patent Issued to NANYA TECHNOLOGY on March 4 for "Method for overlay error correction" (Taiwanese Inventor)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,202, issued on March 4, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Method for overlay error correction" was invented by Shih-Yuan Ma (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a method for overlay error correction. The method includes: obtaining an overlay error based on a lower-layer pattern and an upper-layer pattern of a wafer, wherein the lower-layer pattern is obtained by first fabrication equipment through which the wafer passes, and the upper-layer pattern is obtained by exposure equipment; generating a corrected overlay error based on the overlay error and fabrication...