US Patent Issued to NANYA TECHNOLOGY on March 4 for "Method and system of operating overlay measuring" (Taiwanese Inventor)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,246, issued on March 4, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Method and system of operating overlay measuring" was invented by Chien-Hsien Liu (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides an optical system and a method of operating an overlay measuring apparatus. The overlay measuring apparatus is adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality ...