ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,473, issued on March 18, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Electronic system of specimen qualification" was invented by Hung-Chih Chang (New Taipei, Taiwan), Chug-Chi Chu (New Taipei, Taiwan), Chi-Min Tu (New Taipei, Taiwan) and Wun-Ye Ku (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for a...