ALEXANDRIA, Va., June 25 -- United States Patent no. 12,342,526, issued on June 24, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Semiconductor device and method for fabricating the same" was invented by Tsu-Chieh Ai (Taitung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device and a method of manufacturing a semiconductor device are provided. The semiconductor device includes a substrate and a conductive pad disposed on the substrate and having a first surface facing away from the substrate. The first surface of the conductive pad is recessed toward the substrate and defines a recessed portion. The semiconductor device also includes a capacitor structure at least par...