US Patent Issued to NANYA TECHNOLOGY on June 24 for "Method for fabricating semiconductor device with chelating agent" (Taiwanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,054, issued on June 24, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Method for fabricating semiconductor device with chelating agent" was invented by Wei-Chen Pan (New Taipei, Taiwan) and Chun-Wei Wang (Keelung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a method for fabricating the semiconductor device. The method for fabricating the semiconductor device includes forming a first dielectric layer on a substrate; forming a feature opening to exposing the substrate; performing a pre-cleaning treatment including a pre-cleaning solution to the feature opening; performing a cleaning process t...