US Patent Issued to NANYA TECHNOLOGY on July 8 for "Semiconductor device structure with overlay mark" (Taiwanese Inventor)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,970, issued on July 8, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Semiconductor device structure with overlay mark" was invented by Chun-Yen Wei (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device structure with overlay marks is provided. The semiconductor device structure includes a substrate, a first light-emitting feature, a first pattern and a second pattern. The first light-emitting feature is disposed on the substrate. The first pattern is disposed on the first light-emitting feature. The second pattern is disposed on the first pattern. The first light-emitting feature is configured to emit a...