US Patent Issued to NANYA TECHNOLOGY on July 22 for "Method for manufacturing semiconductor device structure including an overlay mark structure" (Taiwanese Inventor)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,369,439, issued on July 22, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).

"Method for manufacturing semiconductor device structure including an overlay mark structure" was invented by Chun-Yen Wei (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor device structure includes providing a substrate; providing a first light-emitting feature on the substrate, wherein the first light-emitting feature is utilized to emit a fluorescence comprising a first wavelength; providing an overlay mark structure on the first light-emitting feature, wherein the overlay mark structure is configured to abs...