ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,708, issued on April 29, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Wafer carrier dry cleaner" was invented by Jih-Cheng Huang (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer carrier dry cleaner includes a receiver, a tool and a movable nozzle. The receiver includes a clean room. The clean room includes a port used to load a wafer carrier. The wafer carrier comprises a box and a door closing an opening of the box. The tool is located in the clean room and configured to separate the door from the box. The movable nozzle is located in the clean room. The movable nozzle is configured to purge clean gas towards ...