US Patent Issued to Nanotronics Imaging on Nov. 4 for "Deep photometric learning (DPL) systems, apparatus and methods" (New York, New Jersey, California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,462,412, issued on Nov. 4, was assigned to Nanotronics Imaging Inc. (Cuyahoga Falls, Ohio).

"Deep photometric learning (DPL) systems, apparatus and methods" was invented by Matthew C. Putman (Brooklyn, N.Y.), Vadim Pinskiy (Wayne, N.J.), Tanaporn Na Narong (Palo Alto, Calif.), Denis Sharoukhov (Brooklyn, N.Y.) and Tonislav Ivanov (Brooklyn, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured...