ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,217, issued on May 20, was assigned to NANOTECH INC. (Gyeonggi-do, South Korea).
"Apparatus for preventing contamination of self-plasma chamber" was invented by Dong Ho Cha (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and has a shielding means capable of preventing an inflow of negative electrode material, which is generated by a sputtering phenomenon, into a discharge chamber when a positive ...