US Patent Issued to NANOSHIELDS TECHNOLOGY on Oct. 14 for "Protective masks made with polymer-based materials" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,108, issued on Oct. 14, was assigned to NANOSHIELDS TECHNOLOGY Ltd. (Hong Kong).

"Protective masks made with polymer-based materials" was invented by Siu Wah Wong (Hong Kong), Ho Wang Tong (Hong Kong), Chi Hang Yu (Hong Kong), Yu Hang Leung (Hong Kong) and Wing Man Chan (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein are protective masks made with polymer-based materials and methods of forming the materials. Methods of forming the interlaced polymer-based materials comprise applying adhesive to a substrate, electrospinning a first polymer solution onto the substrate from a first group of spinning electrodes, electrospinning...