US Patent Issued to NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY on Dec. 16 for "Refractory organic pollutants with photo- excited holes as electron acceptors" (Chinese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,312, issued on Dec. 16, was assigned to NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY (Nanjing, China).

"Refractory organic pollutants with photo- excited holes as electron acceptors" was invented by Xinbai Jiang (Nanjing, China), Hefei Shi (Nanjing, China), Jinyou Shen (Nanjing, China), Dan Chen (Nanjing, China) and Cheng Hou (Nanjing, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to the technical field of wastewater treatment, and discloses a method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors. The method comprises the following steps: 1) placing a co...