US Patent Issued to Nanchang Hangkong University on May 27 for "Method for generating industrial defect image, device, medium, and product" (Chinese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,232, issued on May 27, was assigned to Nanchang Hangkong University (Nanchang, China).

"Method for generating industrial defect image, device, medium, and product" was invented by Congxuan Zhang (Nanchang, China), Shijie Zhang (Nanchang, China), Leqi Jiang (Nanchang, China), Liyue Ge (Nanchang, China), Zige Wang (Nanchang, China), Zhen Chen (Nanchang, China), Chengzhong Wu (Nanchang, China) and Yaonan Wang (Nanchang, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for generating an industrial defect image, a device, a medium, and a product are provided, relating to the field of image processing. The method includes: acquiring an indust...