US Patent Issued to NALUX on Oct. 28 for "Method for manufacturing mold for retroreflective element and method for manufacturing retroreflective element" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,079, issued on Oct. 28, was assigned to NALUX Co. LTD. (Osaka, Japan).

"Method for manufacturing mold for retroreflective element and method for manufacturing retroreflective element" was invented by Sho Arai (Osaka, Japan) and Yukinobu Nishio (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a mold for a retroreflective element, the mold having plural polygonal faces having a common vertex, the method including the steps of: roughing of a polygonal face in which cutting is carried out such that a predetermined cutting amount in a finishing process is left with respect to a desired shape; and finishing of the po...