US Patent Issued to NALINV NANOTECHNOLOGY (SHANGHAI) on Sept. 30 for "Birdstrike avoidance optical flexible film, preparation method and application thereof" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,604, issued on Sept. 30, was assigned to NALINV NANOTECHNOLOGY (SHANGHAI) Co. LTD. (Shanghai).

"Birdstrike avoidance optical flexible film, preparation method and application thereof" was invented by Lin Xiao (Shanghai) and Yijie Zhou (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure relates to a birdstrike avoidance optical flexible film, a preparation method and application thereof. The birdstrike avoidance optical flexible film includes from top to bottom: a protective layer, a reflective layer, a substrate layer, an adhesive layer, and a release layer. The film has excellent selective transmission and reflection properties...