US Patent Issued to MUSASHI ENGINEERING on July 22 for "Planar liquid film forming method and planar liquid film forming apparatus" (Japanese Inventor)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,365,005, issued on July 22, was assigned to MUSASHI ENGINEERING INC. (Tokyo).

"Planar liquid film forming method and planar liquid film forming apparatus" was invented by Kazumasa Ikushima (Mitaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Problem: To provide a technology for forming a planar liquid film having less surface unevenness than ever before using a jet-type discharge device.Solution: Provided is a planar liquid film forming method of forming a planar liquid film on an application target using a jet-type discharge device having a plurality of discharge ports, and an apparatus for implementing the method. In the method, the plurality...