ALEXANDRIA, Va., July 3 -- United States Patent no. 12,348,217, issued on July 1, was assigned to MURATA MANUFACTURING Co. LTD. (Kyoto, Japan).
"Filter device" was invented by Shintaro Otsuka (Nagaokakyo, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An insulating layer includes a cavity in a portion covering a conductive layer. A through conductor includes an insertion portion inside the cavity and a shoulder portion on a virtual boundary surface with the insertion portion when viewed in a direction parallel or substantially parallel to a main surface. The cavity is located alternately outside and inside an edge of the shoulder portion in a circumferential direction of the shoulder portion when viewe...