US Patent Issued to Morimatsu (Jiangsu) Heavy Industry, Shanghai Morimatsu Engineering Technology on Nov. 25 for "Bis(fluorosulfonyl)imide impurity removal and purification system and bis(fluorosulfonyl)imide impurity removal and purification method" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,479,725, issued on Nov. 25, was assigned to Morimatsu (Jiangsu) Heavy Industry Co. Ltd. (Rugao, China) and Shanghai Morimatsu Engineering Technology Co. LTD (Shanghai).

"Bis(fluorosulfonyl)imide impurity removal and purification system and bis(fluorosulfonyl)imide impurity removal and purification method" was invented by Hongwei Chen (Rugao, China), Sheng Xu (Rugao, China), Lurong Mao (Rugao, China), Zhenxing Li (Rugao, China) and Koei Nishimatsu (Rugao, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a bis(fluorosulfonyl)imide impurity removal and purification system and a bis(fluorosulfonyl)imide impurity removal and purifi...