ALEXANDRIA, Va., April 2 -- United States Patent no. 12,265,057, issued on April 1, was assigned to MKS INSTRUMENTS INC. (Andover, Mass.).

"Monitoring radical particle concentration using mass spectrometry" was invented by Chenglong Yang (Fremont, Calif.), Jimmy Liu (San Jose, Calif.) and James Edward Blessing (Morgan Hill, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ...