ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,791, issued on May 27, was assigned to Mitutoyo Corp. (Kanagawa-ken, Japan).
"Digital holography metrology system" was invented by Nick Hartmann (Newcastle, Wash.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A digital holography metrology system is provided including a heterodyne light source, an interferometric optical arrangement and a sensor arrangement. The heterodyne light source provides combined laser beams of different corresponding frequencies and wavelengths (e.g., for which each combined beam may include a corresponding wavelength laser beam and a corresponding frequency shifted laser beam, which may be orthogonally polarized). The inte...