US Patent Issued to Mitutoyo on March 4 for "Metrology system utilizing annular optical configuration" (Washington Inventor)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,047, issued on March 4, was assigned to Mitutoyo Corp. (Kanagawa-ken, Japan).

"Metrology system utilizing annular optical configuration" was invented by Paul Gerard Gladnick (Seattle).

According to the abstract* released by the U.S. Patent & Trademark Office: "An annular optical configuration is provided for utilization in a metrology system to redirect source light. The metrology system includes a camera that provides images of a workpiece at different focus positions through operation of a variable focal length lens and an objective lens configuration (OLC). The OLC includes one of a plurality of objective lenses having respective working distances and working distance focus po...