ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,207, issued on Nov. 18, was assigned to MITSUI MINING & SMELTING Co. LTD. (Japan).
"Tantalate dispersion and tantalate compound" was invented by Syuhei Hara (Omuta, Japan) and Akinori Kumagai (Omuta, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a novel tantalate dispersion containing no hardly-volatile organic component and having high dispersibility in water, the tantalate dispersion containing tantalum or/and tantalate and amine in water, the tantalate dispersion having an intensity ratio (5.5deg/29deg) of an intensity at 2Theta=5.5deg to an intensity at 2Theta=29deg being 1.00 or more in an X-ray diffraction pattern obtained b...