US Patent Issued to MITSUI CHEMICALS on Nov. 18 for "Pellicle demounting method and pellicle demounting preprocessing device" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,630, issued on Nov. 18, was assigned to MITSUI CHEMICALS INC. (Tokyo).

"Pellicle demounting method and pellicle demounting preprocessing device" was invented by Akira Ishikawa (Ichihara, Japan) and Kazuo Kohmura (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle demounting method includes providing a stack including a photomask, a pellicle frame, and a pellicle film that are arranged in this order, forming of a pressure-sensitive adhesive layer on the pellicle film in the stack, and a demounting step of demounting at least the pellicle film and the pressure-sensitive adhesive layer from the photomask in the stack having the pres...