US Patent Issued to Mitsubishi Materials on Feb. 3 for "Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,542,258, issued on Feb. 3, was assigned to Mitsubishi Materials Corp. (Tokyo).

"Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus" was invented by Fumiaki Ishikawa (Saitama, Japan), Yuto Kurata (Amagasaki, Japan), Tsukasa Yasoshima (Sanda, Japan), Ichiro Shiono (Amagasaki, Japan) and Takuma Katase (Sanda, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A member for a plasma processing apparatus includes a base material and a heat transfer layer provided on one surface of the base material, and the heat transfer layer contains at least one of a fluorine-based resin and a fluorine-based elastomer."...