ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,391,569, issued on Aug. 19, was assigned to Mitsubishi Materials Electronic Chemicals Co. Ltd. (Akita, Japan) and Mitsubishi Materials Corp. (Tokyo).

"Black material and method for producing same, black photosensitive composition and method for producing same, and black patterning film and method for forming same" was invented by Kensuke Kageyama (Akita, Japan), Takashi Konishi (Akita, Japan), Tasuku Sugiura (Naka, Japan) and Masaya Karube (Naka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A black material of the present invention consists of a zirconium nitride powder containing yttrium. The amount of the yttrium is 1.0% by mass to 12.0% by ma...