US Patent Issued to MITSUBISHI GAS CHEMICAL on Dec. 16 for "Particulate matter filling method and particulate matter filling device" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,201, issued on Dec. 16, was assigned to MITSUBISHI GAS CHEMICAL COMPANY INC. (Tokyo).

"Particulate matter filling method and particulate matter filling device" was invented by Shunsuke Nose (Kyoto, Japan), Akira Honjoh (Kyoto, Japan), Yota Yoshida (Tokyo), Atsushi Inoue (Tokyo) and Kazuhiro Maeno (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a particulate matter filling method for measuring the volume of particulate matter and filling the particulate matter into a container, the method being able to improve the performance of a facility while maintaining high quality measurement accuracy. This method includes: moving a first part...