US Patent Issued to Mitsubishi Chemical on Aug. 12 for "Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth)acrylic ester and production method therefor" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,384,863, issued on Aug. 12, was assigned to Mitsubishi Chemical Corp. (Tokyo).

"Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth)acrylic ester and production method therefor" was invented by Kazuaki Mukai (Tokyo), Takeru Jo (Tokyo), Yoshihiro Kamon (Tokyo), Satoshi Sakuma (Tokyo) and Ryuichi Ansai (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R1 represents a hydroge...