ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,000, issued on Sept. 9, was assigned to MINEBEA MITSUMI Inc. (Nagano, Japan).
"Strain gauge" was invented by Atsushi Kitamura (Nagano, Japan), Toshiaki Asakawa (Nagano, Japan), Aya Ono (Nagano, Japan) and Akiyo Yuguchi (Nagano, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A strain gauge includes a flexible resin substrate and a resistor formed of a film that includes Cr, CrN, and Cr2N, the resistor being situated on or above the substrate. A film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm."
The patent was filed on March 26, 2021, under Application No. 17/907,567.
*For further information,...