US Patent Issued to Microwave Chemical on May 6 for "Treatment apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,290,792, issued on May 6, was assigned to Microwave Chemical Co. Ltd. (Osaka, Japan).

"Treatment apparatus" was invented by Yasunori Tsukahara (Osaka, Japan), Satoshi Morikawa (Osaka, Japan), Yukari Deguchi (Osaka, Japan), Yuka Kotake (Osaka, Japan), Hideshi Kurihara (Osaka, Japan), Hisao Watanabe (Osaka, Japan), Fumihiro Kayamori (Osaka, Japan) and Kanako Kaihara (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to provide a treatment apparatus that can efficiently perform microwave irradiation, a treatment apparatus includes: a vessel made of a microwave-reflecting material, and having a first end and an irradiation opening portion...