ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,669, issued on Sept. 23, was assigned to Microsoft Technology Licensing LLC (Redmond, Wash.).
"Self-aligned mask for humidity barrier patterning" was invented by Di Sun (Bothell, Wash.), Xiao Chuan Ong (Seattle), Seungwoo Lee (Redmond, Wash.) and Wyatt Owen Davis (Bothell, Wash.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a mirror assembly for a scanning device that includes a mirror rotationally supported by flexible beams, the mirror assembly also including a piezoelectric material. The mirror is encased with a cover having a top scanning opening aligned with the mirror to form a scanning assembly. An interior of the ...