ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,046, issued on Nov. 25, was assigned to Microsoft Technology Licensing LLC (Redmond, Wash.).
"Method of selectively etching a metal component" was invented by Shivendra Upadhyay (Copenhagen, Denmark), Saulius Vaitiekenas (Copenhagen, Denmark) and Charles Masamed Marcus (Copenhagen, Denmark).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of selectively etching a metal component of a workpiece further comprising a ferromagnetic insulator component. The method comprises contacting the metal component with an etchant solution. The etchant solution comprises a basic etchant and a solvent. The method is useful in the context of the fabrication of ...