US Patent Issued to Microsoft Technology Licensing, Delft University of Technology on Sept. 9 for "Method of fabricating a hollow wall for controlling directional deposition of material" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,743, issued on Sept. 9, was assigned to Microsoft Technology Licensing LLC (Redmond, Wash.) and Delft University of Technology (Delft, Netherlands).

"Method of fabricating a hollow wall for controlling directional deposition of material" was invented by Pavel Aseev (Delft, Netherlands), Ekaterina Chernysheva (Delft, Netherlands), Amrita Singh (Delft, Netherlands) and Guanzhong Wang (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating a hollow wall for controlling directional deposition of material comprises: forming a layer of resist on a substrate; removing a portion of the resist selectively to form a channel...