US Patent Issued to Micron Technology on Sept. 30 for "Vertical transistor, integrated circuitry, method of forming a vertical transistor, and method of forming integrated circuitry" (Idaho Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,432,928, issued on Sept. 30, was assigned to Micron Technology Inc. (Boise, Idaho).

"Vertical transistor, integrated circuitry, method of forming a vertical transistor, and method of forming integrated circuitry" was invented by Hung-Wei Liu (Meridian, Idaho), Vassil N. Antonov (Boise, Idaho), Ashonita A. Chavan (Boise, Idaho), Darwin Franseda Fan (Boise, Idaho), Jeffery B. Hull (Boise, Idaho), Anish A. Khandekar (Boise, Idaho), Masihhur R. Laskar (Boise, Idaho), Albert Liao (Boise, Idaho), Xue-Feng Lin (Boise, Idaho), Manuj Nahar (Boise, Idaho) and Irina V. Vasilyeva (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a ve...