ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,432,943, issued on Sept. 30, was assigned to Micron Technology Inc. (Boise, Idaho).
"Over-sculpted storage node" was invented by Devesh Dadhich Shreeram (Meridian, Idaho), Sanjeev Sapra (Boise, Idaho), Kangle Li (Boise, Idaho) and Sevim Korkmaz (Boise, Idaho).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, apparatuses, and systems related to an over-sculpted storage node are described. An example method includes forming an opening in a pattern of materials. The method further includes performing an etch to over-sculpt the opening. The method further includes depositing a storage node material in the over-sculpted opening to form an over-sculpted...