US Patent Issued to Micron Technology on Oct. 21 for "Methods of forming microelectronic devices including support contact structures, and related microelectronic devices, memory devices, and electronic systems" (Idaho Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,442, issued on Oct. 21, was assigned to Micron Technology Inc. (Boise, Idaho).

"Methods of forming microelectronic devices including support contact structures, and related microelectronic devices, memory devices, and electronic systems" was invented by Yiping Wang (Boise, Idaho) and Sandra L. Tagg (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming a microelectronic device includes forming a preliminary stack structure including blocks separated by slots, each block including: tiers each including insulative material and sacrificial material; and live contact openings and support contact openings extending completely thr...