US Patent Issued to Micron Technology on Oct. 14 for "Semiconductor device with test pattern structures" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,659, issued on Oct. 14, was assigned to Micron Technology Inc. (Boise, Idaho).

"Semiconductor device with test pattern structures" was invented by Nozomi Kojima (Shiga, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatuses and methods with controlled resist poisoning in manufacturing semiconductor devices are described. An example apparatus includes a first structure and a second structure. The first structure includes a first conductive component and a second conductive component adjacent to one another. The second structure includes a third conductive component and a fourth conductive component adjacent to one another. The third and fou...