ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,590, issued on Nov. 11, was assigned to Micron Technology Inc. (Boise, Idaho).
"Adaptive wear leveling for endurance compensation" was invented by Charles See Yeung Kwong (Redwood City, Calif.), Seungjune Jeon (Santa Clara, Calif.), Wei Wang (Dublin, Calif.) and Zhenming Zhou (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A first blocks of a set of blocks of a memory device is identified. A die on which the first block resides is identified among a plurality of dies of the memory device. A threshold value associated with the die is selected from a range associated with a projected reliability metric of the die. Responsive to determ...