US Patent Issued to Micron Technology on May 27 for "Devices including a stair step structure adjacent a substantially planar, vertically extending surface of a stack structure" (Idaho Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,317,489, issued on May 27, was assigned to Micron Technology Inc. (Boise, Idaho).

"Devices including a stair step structure adjacent a substantially planar, vertically extending surface of a stack structure" was invented by Troy R. Sorensen (Boise, Idaho) and Mohd Kamran Akhtar (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a semiconductor device structure comprises forming a stack structure over a substrate, the stack structure comprising tiers each independently comprising a sacrificial structure and an insulating structure and longitudinally adjacent the sacrificial structure. A masking structure is formed over a por...