US Patent Issued to Micron Technology on March 18 for "On-die formation of single-crystal semiconductor structures" (Idaho Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,256,553, issued on March 18, was assigned to Micron Technology Inc. (Boise, Idaho).

"On-die formation of single-crystal semiconductor structures" was invented by Jeffery Brandt Hull (Boise, Idaho), Anish A. Khandekar (Boise, Idaho), Hung-Wei Liu (Meridian, Idaho) and Sameer Chhajed (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems, and devices for on-die formation of single-crystal semiconductor structures are described. In some examples, a layer of semiconductor material may be deposited above one or more decks of memory cells and divided into a set of patches. A respective crystalline arrangement of each patch may be forme...